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PbTiO3 Thin Films by Chemical Beam Deposition

Published online by Cambridge University Press:  16 February 2011

A.I. Kingon ,
K.Y. Hsieh ,
L.L.H. King ,
S.H. Rou ,
K.J. Bachmann  and
R.F. Davis
A.I. Kingon
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
K.Y. Hsieh
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
L.L.H. King
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
S.H. Rou
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
K.J. Bachmann
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
R.F. Davis
Affiliation:
Department of Materials Science & Engineering, North Carolina State University, Raleigh, North Carolina, 27695.
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Abstract

The feasibility of chemical beam deposition of PbTiO3 thin films is demonstrated. The method utilizes chemical (molecular) beams of metalorganic precursors in a high vacuum chamber. Pyrolysis reactions of the metalorganics at the substrate surface are facilitated by presence of active oxygen from an ozone source. Fine grained, smooth polycrystalline PbTiO3 films have been deposited at substrate temperatures as low as 325°C.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 200: Symposium Y – Ferroelectric Thin Films I , 1990 , 49
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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