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Picosecond Time-Resolved Detection of Plasma Formation and Phase Transitions in Silicon

Published online by Cambridge University Press:  15 February 2011

J. M. Liu
Affiliation:
Gordon McKay Laboratory, Division of Applied sciences, Harvard University, Cambridge, Massachusetts 02138, USA
H. Kurz
Affiliation:
Gordon McKay Laboratory, Division of Applied sciences, Harvard University, Cambridge, Massachusetts 02138, USA
N. Bloembergen
Affiliation:
Gordon McKay Laboratory, Division of Applied sciences, Harvard University, Cambridge, Massachusetts 02138, USA
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Abstract

Picosecond time-resolved reflectivity and transmission changes of bulk silicon and silicon-on-sapphire have been measured to study the electron-hole plasma formation and phase transitions in silicon, induced by picosecond green or ultraviolet pulses. The results provide direct evidence of ultrafast energy transfer to the lattice and ultrafast phase transitions in silicon. Lattice heating up to the melting point and overheating of the melt or boiling have been observed during the picosecond pulse duration.

Type
Research Article
Copyright
Copyright © Materials Research Society 1983

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Footnotes

*

Present address: Department of Electrical and Computer Engineering, SUNY at Buffalo, Amherst, New York 14260, USA

References

REFERENCES

1.Ferris, S. D., Leamy, H. J. and Poate, J. M. eds. Laser-Solid Interactions and Laser Processing (American Institute of Physics, New York 1979).Google Scholar
2.White, C. W. and Peercy, P. S. eds. Laser and Electron Beam Processing of Materials (Academic Press, New York 1980).Google Scholar
3.Gibbons, J. F., Hess, L. D. and Sigmon, T. W. eds. Laser and Electron-Beam Solid Interactions and Material Processing (North-Holland, New York 1981).Google Scholar
4.Appleton, B. R. and Celler, G. K. eds. Laser and Electron-Beam Interactions with Solids (North-Holland, New York 1982).Google Scholar
5.Auston, D. H., Golovchenko, J. A., Simons, A. L., Surko, C. M. and Venkatesan, T. N. C., Appl. Phys. Lett. 34, 777 (1979).Google Scholar
6.Lowndes, D. H., Phys. Rev. Lett. 48, 267 (1982).Google Scholar
7.Lee, M. C., Lo, H. W., Aydinli, A. and Compaan, A., Appl. Phys. Lett. 38, 499 (1981).Google Scholar
8.Stritzker, B., Pospieszczyk, B. and Tagle, T. A., Phys. Rev. Lett. 47, 356 (1981).Google Scholar
9.Liu, J. M., Yen, R., Kurz, H. and Bloembergen, N., Appl. Phys. Lett. 39, 755 (1981).Google Scholar
10.Yen, R., Liu, J. M., Kurz, H. and Bloembergen, N., Appl. Phys. A 27, 153 (1982).Google Scholar
11.Liu, J. M., Optics Lett. 7, 196 (1982).Google Scholar
12.Heavens, O. S., Optical Properties of Thin Solid Film (Dover Publications, New York 1965), p. 46.Google Scholar
13.Liu, J. M., Kurz, H. and Bloembergen, N., Appl. Phys. Lett. 41, 643 (1982).Google Scholar
14.Liu, J. M., Kurz, H. and Bloembergen, N. in: Picosecond Phenomena III, Eisenthal, K. B., Hochstrasser, R. M., Kaiser, W., Laubereau, A. eds. (Springer-Verlag, Berlin Heidelberg 1982) pp. 332335Google Scholar
15.von der Linde, D. and Fabricius, N. in: Picosecond Phenomena III, Eisenthal, K. B., Hochstrasser, R. M., Kaiser, W., Laubereau, A. eds. (Springer-Verlag, Berlin Heidelberg 1982) pp. 336340.Google Scholar
16.Dziewior, J. and Schmid, W., Appl. Phys. Lett. 31, 346 (1977).Google Scholar
17.Bloembergen, N. in: Laser-Solid Interactions and Laser Processing, Ferris, S. D., Leamy, H. J., Poate, J. M. eds. (American Institute of Physics, New York 1979) pp. 19.Google Scholar