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Platelet Inversion Domains Induced by Mg-doping in ELOG AlGaN Films

Published online by Cambridge University Press:  01 February 2011

R. Liu
Affiliation:
Department of Physics and Astronomy, Arizona State University, Tempe, AZ 85287
F. A. Ponce
Affiliation:
Department of Physics and Astronomy, Arizona State University, Tempe, AZ 85287
D. Cherns
Affiliation:
Physics Laboratory, University of Bristol, Bristol BS8 1TL, UK
H. H. Wills
Affiliation:
Physics Laboratory, University of Bristol, Bristol BS8 1TL, UK
H. Amano
Affiliation:
Department of Materials Science and Engineering, Meijo University, Nagoya 468, Japan
I. Akasaki
Affiliation:
Department of Materials Science and Engineering, Meijo University, Nagoya 468, Japan
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Abstract

We have studied the microstructure of heavily Mg-doped Al0.03Ga0.97N films grown by metal-organic vapor phase epitaxy in the lateral overgrowth mode (ELOG). A new type of defects with a platelet shape has been observed. According to TEM analysis, these defects are embedded in the overgrowth regions. The platelet is normal to the ELOG stripe direction [1100]AIGaN, forming trapezoidal trenches on the film surface. The thickness of the platelet is about 100nm. We have identified these defects as inversion domains using convergent beam electron diffraction and HR-TEM. Mg segregation at the coalescence boundaries between ELOG islands is believed to result in the formation of the defects.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

REFERENCES

[1] Romano, L. T., Northrup, J. E., Ptak, A. J. and Myers, T. H., Appl. Phys. Lett. 77, 2479 (2000).Google Scholar
[2] Lilliental-Weber, Z., Benamara, M., Swider, W., Washburn, J., Grzegory, I., Porowski, S., Lambert, D. J. H., Eiting, C. J. and Dupuis, R. D., Appl. Phys. Lett. 75, 4159 (1999).Google Scholar
[3] Vennegues, P., Benaissa, M., Beaumont, B., Feltin, E., De Mierry, P., Dalmasso, S., Leroux, M., and Gibart, P., Appl. Phys. Lett. 77, 880 (2000).Google Scholar
[4] Leroux, M., Vennegues, P., Dalmasso, S., Benaissa, M., Feltin, E., De Mierry, P., Beaumont, B., Damilano, B., Grandjean, N., and Gibart, P., Phys. Stat. Sol. (a) 192, 394 (2002).Google Scholar
[5] Bell, A., Liu, R., Ponce, F. A., Amano, H., Akasaki, I., and Cherns, D., Appl. Phys. Lett. 82, 349 (2003).Google Scholar
[6] Northrup, J. E., Appl. Phys. Lett. 82, 2278 (2003).Google Scholar
[7] Liu, R., Bell, A., Ponce, F. A., Cherns, D., Amano, H. and Akasaki, I., Mat. Res. Soc. Symp. Proc. 743, L1.11.1 (2003).Google Scholar
[8] Ponce, F. A., Bour, D. P., Young, W. T., Saunders, M., and Steeds, J. W., Appl. Phys. Lett. 69, 337 (1996).Google Scholar
[9] Northrup, J. E., Neugebauer, J., and Romano, L. T., Phys. Rev. Lett. 77, 103 (1996).Google Scholar
[10] Liliental-Weber, Z., Benamara, M., Swider, W., Washburn, J., Grzegory, I., Porowski, S., Dupuis, R. D., Eiting, C. J., Physica B, 273/274 124 (1999).Google Scholar