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Precision Microwave Applicators and Systems for Plasma and Materials Processing

Published online by Cambridge University Press:  21 February 2011

Jes Asmussen  and
Richard Garard
Jes Asmussen
Affiliation:
Department of Electrical Engineering, Michigan State University, East Lansing, MI 48824
Richard Garard
Affiliation:
Wavemat Inc., 858 Phoenix Drive, Ann Arbor, MI 48104
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Abstract

Modern applications of microwave energy have imposed new requirements upon microwave processing systems. Interest in energy efficiency, processing uniformity and control of process cycles has placed new design conditions upon microwave power oscillators, microwave systems and microwave applicator design. One approach of meeting new application requirements is the use of single-mode or controlled multimode applicators. The use of a single-mode applicator for plasma generation and materials processing will be presented. Descriptions of actual applicator designs for heating, curing and processing of solid materials and the generations of high and low pressure discharges will be given. The impact of these applicators on the total microwave system including the microwave power source will be described. Specific examples of applicator and associated microwave systems will be detailed for the applications of (1) plasma thin film deposition and (2) the precision processing and diagnosis of materials. Methods of process control and diagnosis, control of process uniformity and process scale up are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 124: Symposium M – Microwave Processing of Materials I , 1988 , 347
Copyright
Copyright © Materials Research Society 1988

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References

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