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Pulsed Excimer Laser Deposition of YBaCuO and BisrCaCuO Compounds : Material Distribution and Stoichiometry

Published online by Cambridge University Press:  28 February 2011

Claude Fuchs  and
Eric Fogarassy
Claude Fuchs
Affiliation:
Centre de Recherches Nucleaires (IN2P3), Laboratoire PHASE (UPR du CNRS n°292), B.P. 20, F-67037 STRASBOURG CEDEX, France
Eric Fogarassy
Affiliation:
Centre de Recherches Nucleaires (IN2P3), Laboratoire PHASE (UPR du CNRS n°292), B.P. 20, F-67037 STRASBOURG CEDEX, France
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Abstract

We investigate, in this study, the laser evaporation processes for the deposition of YBaCuO and BiSrCaCuO compounds, using a pulsed ArF (193 nm) excimer laser. The deposition parameters, especially those which are relevant to the geometrical configuration and optical arrangement of the experimental set-up and laser irradiation conditions are examined in details.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 517
Copyright
Copyright © Materials Research Society 1990

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References

1 Sankur, H. and Cheung, J.T., Appl. Phys. A47, 271 (1988).Google Scholar
2 in High Temperature Superconductors, edited by M.B. Brodsky, R.C. Dynes, K. Kitzawa and HI. Tuller (Mater. Res. Soc. Proc. 9£, Pittsburgh, PA 1988).Google Scholar
3 Bäuerle, D., Appl. Phys. A48, 527 (1989).Google Scholar
4 Fogarassy, E., Fuchs, C., Stoquert, J.P., Siffert, P., Perriere, J. and Rochet, F., J. of Less Common Metals, 151, 249(1989).Google Scholar
5 Venkatesan, T., Wu, X.D., Inam, A. and Wachtman, J.B., Appl. Phys. Lett. 52, (14), 1193 (1988).Google Scholar
6 Fogarassy, E., Fuchs, C., Kerherve, F., Hauchecorne, G. and Perriere, J., J. Mater.Res. 4, n°5,1065 (1989).Google Scholar
7 Lang, S., Narita, N., Higashida, K. and Mazaki, H., Jpn J. Appl. Phys. 26, L1394 (1987).Google Scholar
8 Perriere, J., Fogarassy, E., Hauchecorne, G., Wang, X.Z., Fuchs, C., Rochet, F., Rosenman, I., Simon, C., Defourneau, R.M., Kerherve, F., Enard, J.P. and Laurent, A., Sol. Stat. Comm. 67 (4), 345 (1988).Google Scholar
9 Ready, J.F. in Effects of High Power Laser Radiation (Academic Press, New York, 1971) Chapter 3.Google Scholar
10 Dyer, P.E., Greenough, R.D., Issa, A. and Key, P.H., Appl. Phys. Lett. 53 (6), 534 (1988).Google Scholar
11 Dawson, J., Kaw, P. and Green, B., Physics of Fluids, Vol. 12, n°4,875 (1969).Google Scholar
12 Singh, R.K., Holland, O.W. and Narayan, J., to be published in J. of Appl. Physics (1990).Google Scholar
13 Von Allmen, M., J. of Appl. Phys. 47 n°12,5460 (1976).Google Scholar
14 Geohegan, D.B., Mashburn, D.N., Culbertson, R.J., Pennycook, S.J., Budin, J.D., Valiga, R.E., Sales, B.C., Lowndes, D.H., Boatner, L.A., Sonder, E., Eres, D., Christen, D.K. and Christie, W.H., J. Mater. Res. 3 (6), 1169(1988).Google Scholar
15 Weast, R.C. in Handbook of Chemistry and Physics. 61st ed. (CRC Press, Inc., Boca Raton, FL, 1980–81)Google Scholar
16 Uglov, A.A. and Kokora, A.N., Sov. J. Quantum Electron. 7 n°6 (1977), 671.Google Scholar