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Recent Advances in UV Laser Photodeposition

Published online by Cambridge University Press:  21 February 2011

J. Y. Tsao  and
D. J. Ehrlich
J. Y. Tsao
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
D. J. Ehrlich
Affiliation:
Lincoln Laboratory, Massachusetts Institute of TechnologyLexington, Massachusetts 02173–0073
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Abstract

Techniques for laser-photochemically depositing localized thin films are reviewed. A comparison is made between techniques relying on gas-phase and surface-phase photochemistry. New photoreactions, confined entirely to surface phases, are described, including multimolecular reactions based on methyl methacrylate, and multicomponent reactions based on mixtures of trimethylaluminum and titanium tetrachloride. Recent developments in the use of surface photochemistry to nucleate subsequent growth by pyrolytic chemical vapor deposition are also reported.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 29: Symposium I – Laser-Controlled Chemical Processing of Surfaces , 1983 , 115
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCE

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