Hostname: page-component-cd9895bd7-fscjk Total loading time: 0 Render date: 2024-12-29T12:39:53.574Z Has data issue: false hasContentIssue false
  • English
  • Français

Role of Ag in the Epitaxial Growth of Oxide Thin Films

Published online by Cambridge University Press:  15 February 2011

Clinton B. Lee ,
D. Kumar ,
Rajiv K. Singh ,
Derrick Mathis  and
Donovan Moxey
Clinton B. Lee
Affiliation:
Department of Electrical Engineering, NCA &T State University, Greensboro, NC-27411.
D. Kumar
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, FL-32611.
Rajiv K. Singh
Affiliation:
Department of Materials Science and Engineering, University of Florida, Gainesville, FL-32611.
Derrick Mathis
Affiliation:
Department of Electrical Engineering, NCA &T State University, Greensboro, NC-27411.
Donovan Moxey
Affiliation:
Department of Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695.
Get access

Abstract

In this paper, we have reported our investigations related to the growth of high temperature superconducting YBa2Cu3O7-δ (YBCO) and colossal magnetoresistive La0.7MnxO3-δ (LMO) thin films in presence of silver. The films were grown using pulsed laser deposition (PLD) techniques and characterized using x-ray diffraction, scanning electron microscopy, Squid magnetometer. The focus of our work is on the realization of significant improvement in microstructural and physical properties of these films by the addition of a common material (silver) to the films during their in-situ formation. Optical emission studies of plumes emanating from Ag target have been carried out to find the role of Ag acting as additional source of oxygen-supply to oxide lattices during film-growth.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 474: Symposium L – Epitaxial Oxide Thin Films III , 1997 , 351
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Pulsed Laser Deposition of Thin Films, edited by Chrisey, D.B. and Hubbler, G.K., John Wiley and Sons, New York, 1994.Google Scholar
2. Jin, S., Tiffel, T.H., McCormack, M., Fastnacht, R.A., Ramesh, R., and Chen, L.H., Science, 264, p. 413(1994).Google Scholar
3. Singh, R. K., Bhattacharya, D., Tiwari, P., Narayan, J., and Lee, C.B., Appl. phys. Lett., 60, p. 255 (1992).Google Scholar
4. Kumar, D., Sharon, M., Pinto, R., Apte, P. R., Pai, S.P., Purandare, S.C., Gupta, L.C., Vijyaraghavan, R., Appl. phys. Lett., 62, p. 3522 (1993).Google Scholar
5. Manoharan, S.S., Kumar, D., Hegde, M.S., Satyalakshmi, K.M., Prasad, V., and Subramanyam, S. V., J. Solid State Chem., 117, p. 420 (1995).Google Scholar
6. Kumar, D., Satyalakshami, K.M., Manoharan, S.S., and Hegde, M.S., Bull. Mat. Sci., 17, 625 (1994).Google Scholar