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Room Temperature Contactless Electromodulation Characterization of a Wafer-Sized InGaAs/GaAs/GaAlAs Grinsch Laser Structure
Published online by Cambridge University Press: 15 February 2011
Abstract
Using contactless electroreflectance at 300K we have characterized the complete potential profile of a pseudomorphic 0.98 μm InGaAs/GaAs/GaAlAs graded index of refraction separate confinement heterostructure laser fabricated by molecular beam epitaxy. Signals were detected from all three relevant portions of the sample. Comparison of the observed transitions from the InGaAs single quantum well (SQW) section with an envelope function calculation (including the effects of strain) made it possible to evaluate the In composition and width of SQW. These values were in good agreement with the intended parameters. The energy of 11H, the fundamental conduction to heavy-hole level (which is closely related to the lasing frequency) can easily be determined to less than ± 1 nm at 300K. From the period of the observed Franz-Keldysh oscillations from the graded GaAlAs region it was possible to directly evaluate the built-in electric field in the structure.
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- Copyright © Materials Research Society 1996
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