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Selective Etching of SnO2:F Films with a Pulse Programmable Industrial Fiber Laser

Published online by Cambridge University Press:  24 June 2013

M. Rekow ,
T. Panarello  and
W. S. Sampath
M. Rekow
Affiliation:
EOlite Systems, Inc. 275 Rue Kesmark, Dollard-des-Ormeaux, Québec H9B 3J1, Canada
T. Panarello
Affiliation:
EOlite Systems, Inc. 275 Rue Kesmark, Dollard-des-Ormeaux, Québec H9B 3J1, Canada
W. S. Sampath
Affiliation:
NSF I/UCRC for Next Generation Photovoltaics, Colorado State University, Fort Collins, CO, USA
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Abstract

In our work on laser scribing CdTe solar cells we have found what appears to be an unpublished laser material interaction that allows precise laser etching of SnO2 films to an arbitrary thickness with high uniformity. This precise and efficient laser etching mechanism allows arbitrary reduction of the film thickness in a controlled manner on the scale of tens of nm. In addition to the fine depth selection, we find that there develops a pulse duration dependent microstructure on the surface. This micro microstructure results in a strong diffraction effect in the visible portion of the spectrum. In this work we propose a physical mechanism behind this novel depth selective laser interaction as well as the resultant micro-structure. Finally we demonstrate and propose some possible applications for this process.

Keywords

laser ablationlaser decompositionlaser-induced reaction
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1494: Symposium F – Oxide Semiconductors and Thin Films , 2013 , pp. 277 - 290
Copyright
Copyright © Materials Research Society 2013 

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