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Status of Amorphous Silicon and Related Alloys Prepared by Photochemical Vapor Deposition

Published online by Cambridge University Press:  28 February 2011

Makoto Konagai*
Affiliation:
Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-kuTokyo 152, JAPAN
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Abstract

A review is given of the current status of amorphous Si(a-Si) and related alloys prepared by photo-CVD. Preparation techniques and film quality of the following materials will be reviewed;

  • undoped a-Si films,

  • highly conductive n-type and p-type μc-Si films, a-SiGe films.

  • a-SiC films, superlattice structures.

Finally, the present status of a-Si solar cell performance prepared by photo-CVD will be introduced and the merit of photo-CVD will be discussed.

Type
Articles
Copyright
Copyright © Materials Research Society 1986

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References

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