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Substrate Effects on The Growth of Oriented MgO Thin Films

Published online by Cambridge University Press:  15 February 2011

Bertha P. Chang ,
Neville Sonnenberg  and
Michael J. Cima
Bertha P. Chang
Affiliation:
Ceramics Processing Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA02139
Neville Sonnenberg
Affiliation:
Ceramics Processing Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA02139
Michael J. Cima
Affiliation:
Ceramics Processing Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA02139
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Abstract

MgO thin films were deposited onto SrTiO3 and LaAlO3 single crystal substrates using off-axis rf-Magnetron sputtering. Films from 1000–3000Å thick were grown in an Ar - 20%O2 atmosphere at temperatures between 200 and 700°C. X-ray measurements indicate MgO grows epitaxially on SrTiO3 at temperatures above 400°C. The Microstructure of these films was smooth and dense. At deposition temperatures below 400°C, orientation is Maintained, but a rough plate-like microstructure begins to take over. MgO films deposited on LaAlO3 grow with a high degree of preferred orientation. Film Microstructure resembled MgO deposited on SrTiO3 at temperatures below 400°C. Variations in the quality of MgO films grown on LaAlO3 were also observed which may be related to variations in steps on the substrate surfaces.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 317: Symposium B – Mechanisms of Thin Film Evolution , 1993 , 455
Copyright
Copyright © Materials Research Society 1994

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References

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