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Tensile Tests of Low Density Multilayer Thin Films

Published online by Cambridge University Press:  15 February 2011

D. van Heerden ,
D. Josell  and
D. Shechtman
D. van Heerden
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
D. Josell
Affiliation:
National Institute of Standards and Technology, Gaithersburg, MD 20899
D. Shechtman
Affiliation:
Department of Materials Engineering, Technion, Haifa, Israel
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Abstract

Although mechanical studies of multilayer thin films are increasingly more abundant, the majority of studies merely determine film hardness using micro- or nanoindentation techniques. Actual tensile tests are still quite rare. We have therefore conducted tensile tests of free standing aluminum-titanium multilayer thin films. This system was selected for its potential use as a low density (3.3 g/cm3) structural material with potential aerospace applications. The strongest multilayers produced, with bilayer thicknesses 7nm Ti/16 nm Al, fractured at tensile stresses (UTS) of 900 MPa - well beyond the UTS of either of the constituent materials. Specimen characterization by xray diffraction as well as transmission electron microscopy (TEM) revealed near perfect texturing and an intriguing hcp to fec transformation of the titanium layers during preparation of samples for TEM viewing.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 403: Symposium I – Polycrystalline Thin Films: Structure, Texture, Properties and Applications II , 1995 , 139
Copyright
Copyright © Materials Research Society 1996

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