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Thin Films of Uniform Thickness by Pulsed Laser Deposition

Published online by Cambridge University Press:  16 February 2011

K. B. Erington  and
N. J. Ianno
K. B. Erington
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68588.
N. J. Ianno
Affiliation:
Center for Microelectronic and Optical Materials Research, Dept. of Electrical Engineering, University of Nebraska-Lincoln, Lincoln, NE 68588.
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Abstract

In order to enhance the utility of Pulsed Laser Deposition (PLD), a method to deposit uniform films has been devised. This method employs the deposition profile produced by PLD and the discrete nature of the process. We have simulated this process using experimentally determined deposition profiles and have used the results to design a system that produces films of uniform thickness to within a few percent across a substrate of 1 inch diameter and have obtained excellent agreement between theory and experiment.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 191: Symposium N – Laser Ablation for Materials Synthesis , 1990 , 115
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

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