Hostname: page-component-586b7cd67f-vdxz6 Total loading time: 0 Render date: 2024-11-23T10:29:02.059Z Has data issue: false hasContentIssue false
  • English
  • Français

Ellipsometry Study on Nanoparticles Grown by Atomic Layer Deposition

Published online by Cambridge University Press:  03 July 2013

Xueqi Zhou ,
Ying Zhang ,
Zhengqiong Dong ,
Shiyuan Liu ,
Chuanwei Zhang ,
Bin Huang ,
Kun Cao ,
Bin Shan  and
Rong Chen
Xueqi Zhou
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Ying Zhang
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Zhengqiong Dong
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China.
Shiyuan Liu
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China.
Chuanwei Zhang
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
Bin Huang
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Kun Cao
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Bin Shan
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Rong Chen*
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
*
*Corresponding author: rongchen@mail.hust.edu.cn
Get access

Abstract

Spectroscopic Ellipsometry (SE) was chosen to study thin film growth in atomic layer deposition (ALD). It was shown that Cauchy model had limitations in predicting the ultrathin film thickness at initial few deposition cycles, and the fitting results depend on wavelengths range greatly. Effective Medium Approximation (EMA) model is capable of predicting ultrathin film’s physical properties. Our experiments on Al2O3 growth give supporting evidence on the applicability of EMA model, where it is used to successfully explain the initial nucleation and island like growth. EMA model can be extended to be used for Palladium thin film, which can give reasonable thickness and void content.

Keywords

atomic layer depositionfilmnucleation & growth
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1548: Symposium N – Nanomaterials in the Subnanometer-Size Range , 2013 , mrss13-1548-n03-13
Copyright
Copyright © Materials Research Society 2013 

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES:

George, S. M., Chemical Reviews 110, 111–131 (2009).CrossRefGoogle Scholar
Ott, A. W., Klaus, J. W., Johnson, J. M., and George, S. M., Thin Solid Films 292, 135–144 (1997).CrossRefGoogle Scholar
Puurunen, R. L., Journal of Applied Physics 97, 121301–52 (2005).CrossRefGoogle Scholar
Kim, H., Lee, H. and Maeng, W. J., Thin Solid Films 517, 2563–2580 (2009).CrossRefGoogle Scholar
Knez, M., Nielsch, K. and Niinistö, L., Advanced Materials 19, 3425–3438 (2007).CrossRefGoogle Scholar
Gonçalves, D. and Irene, E. A., Química Nova 25, 794–800 (2002).CrossRefGoogle Scholar
Frank, M. M., Chabal, Y. J. and Wilk, G. D., Applied Physics Letters 82, 4758–4760 (2003).CrossRefGoogle Scholar
von Keudell, A and Jacob, W., Journal of Applied Physics 79, 1092–1098 (1996).CrossRefGoogle Scholar
L. A. S. B. E, Journal of Physics D: Applied Physics 42, 073001 (2009).CrossRefGoogle Scholar
Jiang, G., Pelcher, D., Kwon, D., Clerico, J., and Collins, G., MRS Online Proceedings Library 782, null-null (2003).Google Scholar
Weber, M. J., Mackus, A. J. M., Verheijen, M. A., van der Marel, C., and Kessels, W. M. M., Chemistry of Materials 24, 2973–2977 (2012).CrossRefGoogle Scholar
Campbell, C. T., Surface Science Reports 27, 1–111 (1997).CrossRefGoogle Scholar
Knaut, M., Junige, M., Albert, M., and Bartha, J. W., Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, 01A151-9 (2012).CrossRefGoogle Scholar
Aspnes, D. E., Thin Solid Films 89, 249–262 (1982).CrossRefGoogle Scholar
Zhao, Z. W., Tay, B. K., Lau, S. P., and Xiao, C. Y., Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21, 906–910 (2003).CrossRefGoogle Scholar
Shamala, K. S., Murthy, L. C. S. and Narasimha Rao, K., Materials Science and Engineering: B 106, 269–274 (2004).CrossRefGoogle Scholar
Elam, J. W., Zinovev, A., Han, C. Y., Wang, H. H., Welp, U., Hryn, J. N., and Pellin, M. J., Thin Solid Films 515, 1664–1673 (2006).CrossRefGoogle Scholar
Mackus, A. J. M., Verheijen, M. A., Leick, N., Bol, A. A., and Kessels, W. M. M., Chemistry of Materials (2013).Google Scholar