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Ellipsometry Study on Nanoparticles Grown by Atomic Layer Deposition

Published online by Cambridge University Press:  03 July 2013

Xueqi Zhou ,
Ying Zhang ,
Zhengqiong Dong ,
Shiyuan Liu ,
Chuanwei Zhang ,
Bin Huang ,
Kun Cao ,
Bin Shan  and
Rong Chen
Xueqi Zhou
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Ying Zhang
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Zhengqiong Dong
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China.
Shiyuan Liu
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China. Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China.
Chuanwei Zhang
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
Bin Huang
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Kun Cao
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Bin Shan
Affiliation:
State Key Laboratory of Materials Processing and Die & Mould Technology, School of Materials Science and Engineering ,Huazhong University of Science and Technology, Wuhan 430074, China.
Rong Chen*
Affiliation:
State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China.
*
*Corresponding author: rongchen@mail.hust.edu.cn
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Abstract

Spectroscopic Ellipsometry (SE) was chosen to study thin film growth in atomic layer deposition (ALD). It was shown that Cauchy model had limitations in predicting the ultrathin film thickness at initial few deposition cycles, and the fitting results depend on wavelengths range greatly. Effective Medium Approximation (EMA) model is capable of predicting ultrathin film’s physical properties. Our experiments on Al2O3 growth give supporting evidence on the applicability of EMA model, where it is used to successfully explain the initial nucleation and island like growth. EMA model can be extended to be used for Palladium thin film, which can give reasonable thickness and void content.

Keywords

atomic layer depositionfilmnucleation & growth
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1548: Symposium N – Nanomaterials in the Subnanometer-Size Range , 2013 , mrss13-1548-n03-13
Copyright
Copyright © Materials Research Society 2013 

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