Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-19T11:28:38.119Z Has data issue: false hasContentIssue false

Fabrication, Properties and Electrochemical Applications of Diamond Nanostructures

Published online by Cambridge University Press:  20 December 2012

Nianjun Yang*
Affiliation:
Fraunhofer-Institute for Applied Solid State Physics (IAF), Tullastrasse 72, Freiburg 79108, Germany
Waldemar Smirnov
Affiliation:
Fraunhofer-Institute for Applied Solid State Physics (IAF), Tullastrasse 72, Freiburg 79108, Germany
Christoph E. Nebel
Affiliation:
Fraunhofer-Institute for Applied Solid State Physics (IAF), Tullastrasse 72, Freiburg 79108, Germany
Get access

Abstract

We summarized in this paper the fabrication, properties, and electrochemical applications of diamond nanostructures, mainly diamond nanotextures and diamond nanowires. The characterizations of nanostructures were introduced with different techniques. As example of applications, electrochemical DNA sensing and protein trapping on diamond nanotextures are shown.

Type
Articles
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

Nebel, C.E., Ristein, J., Thin-film Diamond I, Vol. 76 (Elsevier, New York, 2003).Google Scholar
Nebel, C.E., Ristein, J., Thin-film Diamond II, Vol. 77 (Elsevier, New York, 2004).10.1016/S0080-8784(04)80012-7CrossRefGoogle Scholar
Fujishima, A., Einaga, Y., Rao, T. N., Tryk, D.A., Diamond Electrochemistry (Elsevier, Tokyo, 2005)Google Scholar
Koizumi, S., Nebel, C.E., Nesladek, M., Physics and Applications of CVD Diamond, (Wiley-VCH, Weinheim, 2008)10.1002/9783527623174CrossRefGoogle Scholar
Brillas, E., Martinez-Huitle, C.A., Synthetic Diamond Films, (Wiley-VCH, Weinheim, 2012)Google Scholar
Nebel, C. E., Rezek, B., Shin, D., Uetsuka, H., Yang, N., J. Phys. D: Apply. Phys. 40, 6443 (2007)10.1088/0022-3727/40/20/S21CrossRefGoogle Scholar
Hoffmann, R., Kriele, A., Obloh, H., Hees, J., Smirnov, W., Yang, N., Nebel, C.E., Appl. Phys. Lett., 97, 052103(2010).10.1063/1.3476346CrossRefGoogle Scholar
Blank, V., Popov, M. Lvova, N., Gogolinsky, K. Reshetov, V., Diam. Rel. Mat. 7, 427(1998).10.1016/S0925-9635(97)00232-XCrossRefGoogle Scholar
Zheng, G., Patolsky, F., Cui, Y., Wang, W. U., Lieber, C. M., C. M. Nat. Biotech. 23, 1294(2005).10.1038/nbt1138CrossRefGoogle Scholar
Cui, Y., Wei, Q. W., Park, H., Lieber, C.M., Science 293, 1289(2001).10.1126/science.1062711CrossRefGoogle Scholar
Shiomi, H., Jpn. J. Appl. Phys. 36, 7745(1997).10.1143/JJAP.36.7745CrossRefGoogle Scholar
Masuda, H., Watanabe, M., Yasui, K., Tryk, D., Rao, T., Fujishima, A., Adv. Mater. 12, 444(2000).10.1002/(SICI)1521-4095(200003)12:6<444::AID-ADMA444>3.0.CO;2-K3.0.CO;2-K>CrossRef3.0.CO;2-K>Google Scholar
Shenderiva, O.A., Padgett, C.W., Hu, Z., Brenner, D.W., J.Vac. Sci. Technol. B 23, 2457(2005)10.1116/1.2122907CrossRefGoogle Scholar
Kobashi, K., et al. , J. Mater. Res. 18, 305(2003)10.1557/JMR.2003.0042CrossRefGoogle Scholar
Zou, Y.S., TYang, Y., Zhang, W.J., Chong, Y.M., He, B., Bello, I., Lee, S.T., Appl. Phys. Lett. 92, 053105(2008).10.1063/1.2841822CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Osawa, E., Nebel, C. E., Nano. Lett. 11, 3572(2008).10.1021/nl801136hCrossRefGoogle Scholar
Nebel, C.E., Yang, N., Uetsuka, H., Osawa, E., Tokuda, N., William, O., Diam. Rel. Mat., 18, 910(2009).10.1016/j.diamond.2008.11.024CrossRefGoogle Scholar
Nebel, C.E., Yang, N., Uetsuka, H., Osawa, E., Tokuda, N., William, O., Japan New Diamond Forum, 24, 10(2008).Google Scholar
Smirnov, W., Kriele, A., Yang, N., Nebel, C.E., Diam. Rel. Mat. 19, 186(2010).10.1016/j.diamond.2009.09.001CrossRefGoogle Scholar
Smirnov, W., Hees, J. J., Brink, D., Müller-Sebert, W., Kriele, A., Williams, O. A., Nebel, C. E., Appl. Phys. Lett., 97, 073117(2010).10.1063/1.3480602CrossRefGoogle Scholar
Hwang, D.S., Saito, T., Fujimori, N., Diam. Rel. Mat., 13, 2207(2004).10.1016/j.diamond.2004.07.020CrossRefGoogle Scholar
Ando, Y., Nishibayashi, Y., Sawabe, A., Diam. Rel. Mat., 13, 633(2004).10.1016/j.diamond.2003.10.066CrossRefGoogle Scholar
Li, C.Y., Hatta, A., Diam. Rel. Mat., 15, 357(2006).10.1016/j.diamond.2005.06.035CrossRefGoogle Scholar
Baik, E.-S., Baik, Y.-J., Lee, S.W., Jeon, D., Thin Solid Films 377378, 295(2000).10.1016/S0040-6090(00)01431-0CrossRefGoogle Scholar
Babchenko, O., Kromka, A., Hruska, K., Michalka, M., Potmesil, J., Vanecek, M., Cent. Eur. J. Phys. 7, 310(2009).Google Scholar
Janssen, W., Gheeraert, E., Diam. Rel. Mat., 20, 389(2011).10.1016/j.diamond.2011.01.037CrossRefGoogle Scholar
Lin, J.Y., Li, Z.-C., Chen, C.-Y., Chou, L.-J., Hwang, J.-C., Kou, C.-S., Diam. Rel. Mat., 20, 922(2011).10.1016/j.diamond.2011.05.005CrossRefGoogle Scholar
Wei, M., Terashima, C., Lv, M., Fujishima, A., Gu, Z.-Z., Chem. Commun. 45, 3624(2009).10.1039/b903284cCrossRefGoogle Scholar
Kriele, A., Williams, O.A., Wolfer, M., Hees, J., Smirnov, W., Nebel, C.E., Chem. Phys. Lett. 507, 253(2011).10.1016/j.cplett.2011.03.089CrossRefGoogle Scholar
Yang, Q., Chen, W., Xiao, C., Hirose, A., Sammynaiken, R., Diam. Rel. Mat., 14, 1683(2005).10.1016/j.diamond.2005.06.009CrossRefGoogle Scholar
Chih, Y.K., Chueh, Y.L., Chen, C.H., Hwang, J., Chou, L.J., Kou, C.S., Diam. Rel. Mat., 15, 1246(2006).10.1016/j.diamond.2005.09.037CrossRefGoogle Scholar
Luo, D., Wu, L., Zhi, J., ACS Nano, 8, 2121(2009).10.1021/nn9003154CrossRefGoogle Scholar
Terranova, M.L., Orlanducci, S., Fiori, A., Tamburri, E., Sessa, V., Rossi, M., Barnard, A.S., Chem. Mater. 17, 3214(2005).10.1021/cm0502018CrossRefGoogle Scholar
Janssen, W., Faby, S., Gheeraert, E., Diam. Rel. Mat., 20, 779(2011).10.1016/j.diamond.2011.03.024CrossRefGoogle Scholar
Finklea, H.O., in: Finklea, H.O., Semiconductor Electrodes, (Elsevier, Amsterdam, 1988) p. 27.Google Scholar
Bard, A.J., Faulkner, L.R., Electrochemical Methods: Fundamentals and Applications, 2nd edition, (Wiley, New York 2001).Google Scholar
Kuo, T.-C., McCreery, R. L., Swain, G. M., Electrochem. Solid-State Lett. 2, 288(1999).10.1149/1.1390813CrossRefGoogle Scholar
Wang, J., Firestone, M.A., Auciello, O., Carlisle, J.A., Langmuir 20, 11450(2004).10.1021/la048740zCrossRefGoogle Scholar
Shin, D., Tokuda, N., Rezek, B., Nebel, C. E., Electrochem. Commun. 8, 844(2006).10.1016/j.elecom.2006.03.014CrossRefGoogle Scholar
Uetsuka, H., Shin, D., Tokuda, N., Saeki, K., Nebel, C. E., Langmuir 23, 3466(2007).10.1021/la063241eCrossRefGoogle Scholar
Yang, N., Yu, J., Uetuska, H., Nebel, C. E., Electrochem. Commu. 11, 2237(2009).10.1016/j.elecom.2009.09.039CrossRefGoogle Scholar
Hoffmann, R., Obloh, H., Tokuda, N., Yang, N., Nebel, C.E., Langmuir 28, 47(2012).10.1021/la2039366CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Osawa, E., Nebel, C.E., Angew. Chem. Int. Ed., 47, 5183(2008).10.1002/anie.200801706CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Osawa, E., Nebel, C.E., Diam. Rel. Mat., 18, 592(2009).10.1016/j.diamond.2008.08.007CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Nebel, C.E., Adv. Func. Mate. 19, 887(2009).10.1002/adfm.200801392CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Williams, O.A., Osawa, E., Tokuda, N., Nebel, C.E., phys. status solidi a, 206, 2048(2009).10.1002/pssa.200982222CrossRefGoogle Scholar
Numnuam, A., et al. ., J. Am. Chem. Soc. 130, 410(2008).10.1021/ja0775467CrossRefGoogle Scholar
Panke, O., Kirbs, A., Lisdat, F., Biosens. Bioelectron. 22, 2656 (2007).10.1016/j.bios.2006.10.033CrossRefGoogle Scholar
Aoki, H., Tao, H., Analyst 132, 784(2007).10.1039/B704214KCrossRefGoogle Scholar
Fan, C., Plaxco, K. W., Heeger, A. J., Proc. Nat. Acde. Sci. USA 100, 9134(2003).10.1073/pnas.1633515100CrossRefGoogle Scholar
Vermeeren, V., et al. ., Langmuir 23, 13193(2007).10.1021/la702143dCrossRefGoogle Scholar
Gu, H., Su, X-d., Loh, K. P., J. Phys. Chem. B 109, 13611(2005).10.1021/jp050625pCrossRefGoogle Scholar
Lapierre-Devlin, M. A., Asher, C. L., Taft, B. J., Gasparac, R., Roberts, M. A., Kelley, S. O., Nano. Lett. 5, 1051(2005).10.1021/nl050483aCrossRefGoogle Scholar
Gasparac, R., Taft, B. J., Lapierre-Devlin, M. A., Lazareck, A. D., Xu, J. M., Kelley, S. O., J. Am Chem. Soc. 126, 12270 (2004).10.1021/ja0458221CrossRefGoogle Scholar
Smirnov, W., Yang, N., Hoffmann, R., Hees, J., Obloh, H., Müller-Sebert, W., Nebel, C.E., Anal. Chem., 83, 7438(2011).10.1021/ac201595kCrossRefGoogle Scholar
Yang, N., Smirnov, W., Hees, J., Hoffmann, R., Kriele, A., Obloh, H., Müller-Sebert, W., Nebel, C.E., phys. status solidi a, 208, 2087(2011).10.1002/pssa.201100016CrossRefGoogle Scholar
Yang, W., et al. ., Nat. Mater. 1, 253(2002).10.1038/nmat779CrossRefGoogle Scholar
Shin, D., Rezek, B., Tokuda, N., Takeuchi, D., Watanabe, H., Nakamura, T., Yamamoto, T., Nebel, C.E., phys. status solidi (a), 203, 3245(2006).10.1002/pssa.200671402CrossRefGoogle Scholar
Yang, N., Uetsuka, H., Watanabe, H., Nakamura, T., Nebel, C.E., C.E. Chem. Mater. 19, 2852(2007).10.1021/cm070349mCrossRefGoogle Scholar
Dolla, A., Blanchard, L., Guerlesquin, F., Bruschi, M., Biochimie 76, 471(1994).10.1016/0300-9084(94)90171-6CrossRefGoogle Scholar
Allen, H., Hill, O., Hunt, N.I., Bond, A.M., J. Electroanal Chem. 436, 17(1997).10.1016/S0022-0728(97)00307-0CrossRefGoogle Scholar
Taniguchi, I., et al. , Electrochem. Commu. 5, 857(2003).10.1016/j.elecom.2003.08.006CrossRefGoogle Scholar
Wang, L., Wang, E., Electrochem. Commu. 6, 49(2004).10.1016/j.elecom.2003.10.004CrossRefGoogle Scholar
Zhao, G.-C., Yin, Z.-Z., Zhang, L., Wei, X.-W., Electrochem. Commu. 7, 256(2005).10.1016/j.elecom.2005.01.006CrossRefGoogle Scholar
Haymond, S., Babcock, G.T., Swain, G.M., J.Am Chem. Soc. 124, 10634(2002).10.1021/ja027019hCrossRefGoogle Scholar
Marken, F., Paddon, C.A., Asogan, D., Electrochem. Commu. 4, 62(2002).10.1016/S1388-2481(01)00272-7CrossRefGoogle Scholar
Baker, S.E., Colavita, P., Tse, K.-Y., Hamers, R.J.. Chem. Mater. 18, 4415(2006).10.1021/cm0609000CrossRefGoogle Scholar
Geng, R., Zhao, G., Liu, M., Li, M., Biomaterials, 29, 2794(2008).10.1016/j.biomaterials.2008.03.004CrossRefGoogle Scholar
Zhou, Y., Zhi, J., Zou, Y., Zhang, W., Lee, S.-T., Anal. Chem. 80, 4141(2008).10.1021/ac702417xCrossRefGoogle Scholar
Hoffmann, R., Kriele, A., Kopta, S., Smirnov, W., Yang, N., Nebel, C.E., phys. status solidi a, 207, 2073(2010).10.1002/pssa.201000043CrossRefGoogle Scholar
Hoffmann, R., Kriele, A., Obloh, H., Tokuda, N., Smirnov, W., Yang, N., Nebel, C.E., Biomaterials, 32, 7325(2011).10.1016/j.biomaterials.2011.06.052CrossRefGoogle Scholar
Yang, N., Hoffmann, R., Smirnov, W., Kriele, A., Nebel, C.E., Electrochem. Commun., 12, 1218(2010).10.1016/j.elecom.2010.06.023CrossRefGoogle Scholar
Laviron, E., J. Electronanal Chem. 101, 19(1979).10.1016/S0022-0728(79)80075-3CrossRefGoogle Scholar
Xu, X., Tian, B., Kong, J., Zhang, S., Liu, B., Zhao, D., Adv. Mater. 15, 1932(2003).10.1002/adma.200305424CrossRefGoogle Scholar
Dai, Z., Liu, S., Ju, H., Electrochima Acta 49, 2139(2004).10.1016/j.electacta.2003.12.040CrossRefGoogle Scholar
Liu, H., Tian, Y., Deng, Z., Langmuir 23, 9487(2007).10.1021/la700817yCrossRefGoogle Scholar
Ju, H., Liu, S., Ge, B., Lisdat, F., Scheller, F. W., Electroanalysis 14, 141(2002).10.1002/1521-4109(200201)14:2<141::AID-ELAN141>3.0.CO;2-Y3.0.CO;2-Y>CrossRef3.0.CO;2-Y>Google Scholar
Liu, Y. C., Cui, S. Q., Zhao, J., Yang, Z. S., Eletrochem. 71, 121(2006).Google Scholar