Hostname: page-component-78c5997874-8bhkd Total loading time: 0 Render date: 2024-11-19T18:01:28.037Z Has data issue: false hasContentIssue false
  • English
  • Français

GaN Crystals Grown in the Increased Volume High-Pressure Reactors

Published online by Cambridge University Press:  10 February 2011

S. Porowski ,
M. Bockowski ,
B. Lucznik ,
M. Wroblewski ,
S. Krukowski ,
I. Grzegory ,
M. Leszczynski ,
G. Nowak ,
K. Pakula  and
J. Baranowski
S. Porowski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
M. Bockowski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
B. Lucznik
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
M. Wroblewski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
S. Krukowski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
I. Grzegory
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
M. Leszczynski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
G. Nowak
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl
K. Pakula
Affiliation:
Institute of the Experimental Physics University of Warsaw, Hoza 69, Warsaw, Poland
J. Baranowski
Affiliation:
High Pressure Research Center Polish Academy of Sciences, Sokolowska 29/37, 01-142 Warsaw, Polandsylvek@iris.unipress.waw.pl Institute of the Experimental Physics University of Warsaw, Hoza 69, Warsaw, Poland
Get access

Abstract

GaN single crystals are grown from the solution of atomic nitrogen in liquid Ga at N2 pressure up to 20 kbar. The crystals reaching dimensions of 1cm, with dislocation density of 103 - 105 cm-2 are currently obtained and successfully used for homoepitaxy by MOCVD and MBE.

The increase of the maximum size of GaN crystals with stable morphology requires the increase of the volume of the crucible. Beside the obvious geometric factors, the increase of the volume of the furnace and crucible allows to achieve much better control of supersaturation profiles in the solution and therefore better control of growth process. It helps to avoid morphological instabilities and leads to the growth of transparent, inclusion free crystals.

In the paper, the results of crystallization of substrate quality GaN crystals obtained with the use of large volume high pressure reactor will be presented. The crystals were characterized by High Resolution X-ray Diffraction and Atomic Force Microscopy. It will be shown that the quality of GaN crystals does not deteriorate with the increasing size and that epi-ready surfaces of GaN substrates can be obtained. Two-dimensional growth by propagation of monoatomic steps of GaN homoepitaxial layers will be presented as a verification of the quality of GaN substrates.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 449: Symposium N – III-V Nitrides , 1996 , 35
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

[1] Nakamura, S., Mukai, T. and Senoh, M., J. Appl. Phys. 76 (1994), 8189 Google Scholar
[2] Nakamura, S., Senoh, M., Nagahama, S., Iwasa, N., Yamada, T., Matsushita, T., Kiyoku, H. and Sugimoto, Y., Jap. J. Appl. Phys. 35, (1996), L217 Google Scholar
[3] Van Vechten, J.A., Phys. Rev. B7, 1479 (1973)Google Scholar
[4] Karpinski, J., Jun, J. and Porowski, S. , J.Cryst. Growth, 66, 1, (1984)Google Scholar
[5] Grzegory, I., Jun, J., Bockowski, M., Krukowski, St., Wroblewski, M., Lucznik, B. and Porowski, S., J. Phys. Chem. Solids vol.56, No 3/4, pp 639–647, (1995)Google Scholar
[6] Liliental-Weber, Z., Kisielowski, C., Ruvimov, S., Chen, Y, Washburn, J., Grzegory, I., Bockowski, M., Jun, J. and Porowski, S., Journal of Electronic Materials, Vol.25, No9,1996 Google Scholar
[7] Porowski, S., Baranowski, J. M., Leszczynski, M., Jun, J., Bockowski, M., Grzegory, I., Krukowski, S., Wróblewski, M., £ucznik, B., Nowak, G., Pakula, K., Wysmolek, A., Korona, K. P., and Stepniewski, R. International Symposium on Blue Laser and Light Emitting Diodes, Chiba, Japan March 5-7, 1996 Google Scholar
[8] Nowak, G., Krukowski, S., Grzegory, I., Porowski, S., Pakula, K., Baranowski, J. M. and Zak, J., First European GaN Workshop EGW -1, Rigi, Switzerland, June 1-3 1996 Google Scholar
[9] Leszczynski, M., Barski, A., Wiedeman, F., Grzegory, I. ans Porowski, S., to be publishedGoogle Scholar
[10] Krukowski, S., First European GaN Workshop EGW -1, Rigi, Switzerland, June 1-3 1996 Google Scholar