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Infrared Characterization of RF Sputter Etching of Polyimide Thin Films

Published online by Cambridge University Press:  25 February 2011

S.E. Molis ,
D.G. Kim ,
S.P. Kowalczyk  and
J. Kim
S.E. Molis
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
D.G. Kim
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
S.P. Kowalczyk
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
J. Kim
Affiliation:
IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, New York 10598
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Abstract

We present infrared spectroscopy as a means of characterizing polyimide structural changes occurring by RF argon ion sputtering. Samples of PMDA-ODA polyimide on chromium coated substrates have been sputter etched from initial thicknesses of 400 Å down to 10 Å. Relative intensity changes in imide vibrational absorption bands have been interpreted in terms of orientational reordering which occurs during the ion sputtering process. The appearance of a new vibration at 1580 cm–1 in the spectra of samples etched below 50 Å is assigned as the Elu mode of graphite corresponding to a surface damage layer which is of a graphitic form.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 203: Symposium D – Electronic Packaging Materials Science V , 1990 , 53
Copyright
Copyright © Materials Research Society 1991

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References

REFERENCES

1. Oh, T.S., Kowalczyk, S.P., Hunt, D.J. and Kim, J., J. Adhesion Sci. Technol., 4, 119 (1990)Google Scholar
2. Bachman, B.J. and Vasile, M.J., J. Vac. Sci. Technol., A7(4), 2709 (1989)Google Scholar
3. Carlson, D.J. and Wiles, D.M., Canadian J. Chem., 48, 2397 (1970)Google Scholar
4. Dunn, D.S. and McClure, D.J., J. Vac. Sci. Tehnol., A 5(4) 1327 (1987)Google Scholar
5. Lew, J. and Jensen, K.F., Mat. Res. Soc. Symp. Proc. 154, 253 (1989)Google Scholar
6. Greenler, R.G., J. Chem. Phys., 44(1), 310 (1966)Google Scholar
7. Molis, S.E., in “Polyimides: Materials, Chemistry and Characterization”, edited by Feger, C. et al. , (Elsevier Science Publishers, New York, 1989) p.659.Google Scholar
8. lshida, H., Wellinghoff, S.T., Baer, E. and Koenig, J.L., Macromolecules, 13, 826 (1980)Google Scholar
9. Nemanich, R.J. and Lucovsky, G., Solid State Comm., 23, 117 (1977)Google Scholar