Hostname: page-component-78c5997874-j824f Total loading time: 0 Render date: 2024-11-17T23:09:57.375Z Has data issue: false hasContentIssue false
  • English
  • Français

Investigation of Characteristics of Multi-Function ZnO Thin Film Deposited with Various Argon and Oxygen Ratios

Published online by Cambridge University Press:  31 January 2011

Jong-Shin Wu ,
Che-Wei Hsu ,
Tsung-Chieh Cheng ,
Chun-Hui Yang ,
Yi-Ling Shen ,
Sheng-Yao Wu  and
Wen-Hsien Huang
Jong-Shin Wu
Affiliation:
chongsin@faculty.nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Che-Wei Hsu
Affiliation:
chewei.me93g@nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Tsung-Chieh Cheng
Affiliation:
tcchengme@cc.kuas.edu.tw, National Kaoshiung University of Applied Science, Department of Mechanical Engineering, Kaohsiung, Taiwan, Province of China
Chun-Hui Yang
Affiliation:
ivyyang@ndl.org.tw, National Nano Device Laboratories, Hsinchu, Taiwan, Province of China
Yi-Ling Shen
Affiliation:
ylshen@ndl.org.tw, National Nano Device Laboratories, Hsinchu, Taiwan, Province of China
Sheng-Yao Wu
Affiliation:
chongsin@faculty.nctu.edu.tw, National Chiao Tung University, Department of Mechanical Engineering, Hsinchu, Taiwan, Province of China
Wen-Hsien Huang
Affiliation:
1096303160@cc.kuas.edu.tw, National Kaoshiung University of Applied Science, Department of Mechanical Engineering, Kaohsiung, Taiwan, Province of China
Get access

Abstract

The ZnO thin film was successfully deposited on a glass substrate at RT by a RF reactive magnetron sputtering method. Structural, chemical, optical, and hydrophilic/hydrophobic properties are measured by using a surface profilometer, an x-ray diffractometry (XRD), an x-ray photoelectron spectroscopy (XPS), a UV-VIS spectrophotometer, and a contact angle system, respectively. Results show that the deposition rate decreases with increasing O2/(Ar+O2) ratio. Otherwise, the best stoichiometric and quality of ZnO thin film was observed at 0.30 of O2/(Ar+O2) ratio by the smallest FWHM and the strong O-Zn bonds. Regardless of O2/(Ar+O2) ratio effect or thickness effect, high transmittance (> 86%) in the visible region is observed, while the UV-shielding characteristics depend upon both the magnitude of film thickness. The film thickness plays a more prominent role in controlling optical properties, especially in the UV-shielding characteristics, than the O2/(Ar+O2) ratio. However, the hydrophobic characteristics can be obtained when the glass coating with ZnO thin films. In general, with properly coated ZnO thin film, we can obtain a glass substrate which is highly transparent in the visible region, has good UV-shielding characteristics, and possesses highly hydrophobic characteristics (self-clean capability), which is highly suitable for applications in the glass industries.

Keywords

sputteringthin filmx-ray photoelectron spectroscopy (XPS)
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1174: Symposium V – Functional Metal-Oxide Nanostructures , 2009 , 1174-V09-05
Copyright
Copyright © Materials Research Society 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Tüzemen, S. and Gür, Emre, Opt. Mater. 30 (2007) 292.Google Scholar
2 Wager, John F., Science 300 (2003) 1245.Google Scholar
3 Thundat, Thomas, Nature Nanotechnol. 3 (2008) 133.Google Scholar
4 Feng, Y. U. Journal of Wuhan University of Technology-Mater. Sci. Ed., 22 (2007) 385.Google Scholar
5 Ando, E. and Miyazaki, M. Thin Solid Films 516 (2008) 4574.Google Scholar
6 Kim, Kun Ho, Park, Ki Cheol and Ma, Dae Young, J. Appl. Phys. 81 (1997) 7764.Google Scholar
7 Zhang, Yuantao, Du, Guotong, Liu, Dali, Wang, Xinqiang, Ma, Yan, Wang, Jinzhong, Yin, Jingzhi, Yang, Xiaotian, Hou, Xiaoke, and Yang, Shuren, J. Cryst. Growth 243 (2002) 439.Google Scholar
8 Ayala, Marcelo N. Micbael, Ralpb, and Söderberg, Per G., Invest. Ophthalmol. Vis. Sci. 41 (2000) 3539.Google Scholar
9 Yabe, Shinryo, Yamashita, Mika, Momose, Shigeyoshi, Tahira, Kazuyuki, Yoshida, Sakae, Li, Ruixing, Yin, Shu, Sato, Tsugio, Int. J. Inorg. Mater. 3 (2001) 1003.Google Scholar
10 Li, Ruixing, Yabe, Shinryo, Yamashita, Mika, Momose, Shigeyosi, Yoshida, Sakae, Yin, Shu, Sato, Tsugio, Mater. Chem. Phys. 75 (2002) 39.Google Scholar
11 Menon, Rashmi, Sreenivas, K. and Gupta, Vinay, J. Appl. Phys. 103 (2008) 094903.Google Scholar
12 Kittel, Charles, Introduction to Solid State Physics, 8th Edition, Wiley, 2004, pp 54.Google Scholar
13 Nagata, T. Ashida, A. Fujimura, N. and Ito, T. J. Appl. Phys. 95 (2004) 3923.Google Scholar
14 Chang, Yee-Shin, Ting, Jyh-Ming, Thin Solid Films 398-399 (2001) 29.Google Scholar
15 Yoshino, Y. Inoue, K. Takeuchi, M. Ohwada, K. Vacuum 51 (1998) 601.Google Scholar
16 Lai, Li-Wen, Lee, Chinf-Ting, Mater. Chem. Phys. 110 (2008) 393.Google Scholar
17 Chen, M. Wang, X. Yu, Y. H. Pei, Z. L. Bai, X. D. Sun, C. Huang, R. F. Wen, L. S. Appl. Surf. Sci. 158 (2000) 134.Google Scholar
18 Marotti, R.E. Bojorge, C.D. Broitman, E. Cànepa, H.R., Badán, J.A., Dalchiele, E.A. Gellman, A.J., Thin Solid Films, 517 (2008) 1077.Google Scholar
19 Berns, Roy S. Principle of Color Technology, 3rd Edition, John Wiley & Sons Inc., 2002, Ch 6.Google Scholar