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Preparation and Characterization of Single-crystal Aluminum Nitride Substrates

Published online by Cambridge University Press:  03 September 2012

Leo J. Schowalter
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180 Crystal IS, Inc. Latham, NY 12110
J. Carlos Rojo
Affiliation:
Crystal IS, Inc. Latham, NY 12110
Nikolai Yakolev
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180
Yuriy Shusterman
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180
Katherine Dovidenko
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180
Rungjun Wang
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180
Ishwara Bhat
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180
Glen A. Slack
Affiliation:
Rensselaer Polytechnic Institute Troy, NY 12180 Crystal IS, Inc. Latham, NY 12110
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Abstract

Large (up to 10mm diameter) aluminum nitride (AlN) boules have been grown by the sublimation-recondensation method to study the preparation of high-quality single crystal substrates. The growth mechanism of the boules has been studied using AFM. It has been determined that large single crystal grains in those boules grow with a density of screw dislocations below 5×104 cm−3 while edge dislocations are at lower density (none were observed). High-quality AlN single crystal substrates for epitaxial growth have been prepared and characterized using Chemical Mechanical Polishing (CMP) and AFM imaging, respectively. Also, the differential etching effect of KOH solutions on the N and Al-terminated faces of AlN on vicinal c-faces has been investigated. In order to identify the N or Al-terminated face, convergent beam electron diffraction has been used.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

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References

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