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Secondary excitation process for quantitative confocal 3D-XRF analysis

Published online by Cambridge University Press:  12 May 2015

Kouichi Tsuji ,
Atsushi Tabe ,
Peter Wobrauscheck  and
Christina Streli
Kouichi Tsuji*
Affiliation:
Graduate School of Engineering, Osaka City University, 3-3-138, Sugimoto, Sumiyoshi, Osaka, 558-8585, Japan
Atsushi Tabe
Affiliation:
Graduate School of Engineering, Osaka City University, 3-3-138, Sugimoto, Sumiyoshi, Osaka, 558-8585, Japan
Peter Wobrauscheck
Affiliation:
TU Wien, Atominstitut, Wien, Austria
Christina Streli
Affiliation:
TU Wien, Atominstitut, Wien, Austria
*
a) Author to whom correspondence should be addressed. Electronic mail: tsuji@a-chem.eng.osaka-cu.ac.jp
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Abstract

X-ray fluorescence (XRF) is a well-established method for quantitative elemental analysis. For accurate quantification, secondary excitation has to be taken into account. In this paper, the secondary excitation process was discussed for analysis by confocal micro-XRF. Experimental depth profiles were shown for a layered sample of Co and Cu. An additional peak was observed in the depth profile of Co, and it was explained by secondary excitation process. Additionally, a Mosaic model was proposed for quantification of confocal micro- XRF analysis.

Keywords

Confocal micro-XRFmatrix effectquantification
Type
Technical Articles
Information
Powder Diffraction , Volume 30 , Issue 2 , June 2015 , pp. 109 - 112
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Copyright
Copyright © International Centre for Diffraction Data 2015 

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