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Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2 townsend dielectric barrier discharge

Published online by Cambridge University Press:  28 April 2009

C. Sarra-Bournet ,
N. Gherardi ,
S. Turgeon ,
G. Laroche  and
F. Massines
C. Sarra-Bournet*
Affiliation:
Université de Toulouse, UPS, INPT, LAPLACE – Laboratoire Plasma et Conversion d'Énergie, 118 route de Narbonne, 31062 Toulouse Cedex 9, France CNRS, LAPLACE, 31062 Toulouse, France University Hospital Research Center CHUQ, St-Francois d'Assise Hospital, 10 rue de l'Espinay, G1L3L5, Quebec, Canada Surface Engineering Laboratory, CERMA, Department of Mining, Metallurgical and Materials Engineering, Université Laval, G1V 0A6, Quebec, Canada
N. Gherardi
Affiliation:
Université de Toulouse, UPS, INPT, LAPLACE – Laboratoire Plasma et Conversion d'Énergie, 118 route de Narbonne, 31062 Toulouse Cedex 9, France CNRS, LAPLACE, 31062 Toulouse, France
S. Turgeon
Affiliation:
University Hospital Research Center CHUQ, St-Francois d'Assise Hospital, 10 rue de l'Espinay, G1L3L5, Quebec, Canada
G. Laroche
Affiliation:
University Hospital Research Center CHUQ, St-Francois d'Assise Hospital, 10 rue de l'Espinay, G1L3L5, Quebec, Canada Surface Engineering Laboratory, CERMA, Department of Mining, Metallurgical and Materials Engineering, Université Laval, G1V 0A6, Quebec, Canada
F. Massines
Affiliation:
CNRS, PROMES, Tecnosud, 66100 Perpignan, France
*
christian.sarra-bournet.1@ulaval.ca
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Abstract

The present work is an investigation of the chemical composition and growth profile of an hydrogenated amorphous carbon nitride film (a-CN:H) deposited by atmospheric pressure Townsend discharge in C2H4/N2. Various surface characterization techniques were used to evaluate the coatings properties (X-ray Photoelectron Spectroscopy, Fourier Transform Infrared Spectroscopy, Profilometry, Scanning Electron Microscopy). The coating obtained presented a high N/C ratio and a high concentration of N-functionalities. The results revealed two different growth mechanisms depending on the residence time of the precursor molecules; at first, the growth is mainly due to radicals then a powder formation mechanism appears, therefore leading to different chemical composition and surface properties.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 47 , Issue 2: 11th International Symposium on High Pressure, Low Temperature Plasma Chemistry (HAKONE XI) , August 2009 , 22820
Copyright
© EDP Sciences, 2009

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