Crossref Citations
This article has been cited by the following publications. This list is generated based on data provided by
Crossref.
Liu, Shiyuan
2012.
Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology.
Optical Engineering,
Vol. 51,
Issue. 8,
p.
081504.
Chen, Xiuguo
Zhang, Chuanwei
and
Liu, Shiyuan
2013.
Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimetry.
Applied Physics Letters,
Vol. 103,
Issue. 15,
Veis, Martin
Antos, Roman
and
Li, Yue
2013.
Advances in Optical and Magnetooptical Scatterometry of Periodically Ordered Nanostructured Arrays.
Journal of Nanomaterials,
Vol. 2013,
Issue. 1,
Garcia-Caurel, Enric
De Martino, Antonello
Gaston, Jean-Paul
and
Yan, Li
2013.
Application of Spectroscopic Ellipsometry and Mueller Ellipsometry to Optical Characterization.
Applied Spectroscopy,
Vol. 67,
Issue. 1,
p.
1.
Gereige, Issam
Pietroy, David
Eid, Jessica
and
Gourgon, Cécile
2013.
Dimensional characterization of biperiodic imprinted structures using optical scatterometry.
Microelectronic Engineering,
Vol. 112,
Issue. ,
p.
27.
Dong, Zhengqiong
Liu, Shiyuan
Chen, Xiuguo
and
Zhang, Chuanwei
2014.
Determination of an optimal measurement configuration in optical scatterometry using global sensitivity analysis.
Thin Solid Films,
Vol. 562,
Issue. ,
p.
16.
Chen, Xiuguo
Liu, Shiyuan
Zhang, Chuanwei
Jiang, Hao
Ma, Zhichao
Sun, Tangyou
and
Xu, Zhimou
2014.
Accurate characterization of nanoimprinted resist patterns using Mueller matrix ellipsometry.
Optics Express,
Vol. 22,
Issue. 12,
p.
15165.
Cain, Jason P.
Sanchez, Martha I.
Chao, Robin
Kohli, Kriti
Zhang, Yunlin
Madan, Anita
Muthinti, G. Raja
Hong, Augustin J.
Conklin, David
Holt, Judson
and
Bailey, Todd C.
2014.
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond.
Vol. 9050,
Issue. ,
p.
90501E.
Cain, Jason P.
Sanchez, Martha I.
Dixit, Dhairya
Hosler, Erik R.
Preil, Moshe
Keller, Nick
Race, Joseph
Chun, Jun Sung
O’Sullivan, Michael
Montgomery, M. Warren
and
Diebold, Alain
2015.
Optical CD metrology for directed self-assembly assisted contact hole shrink process.
Vol. 9424,
Issue. ,
p.
94240T.
Likhachev, D.V.
2015.
Efficient thin-film stack characterization using parametric sensitivity analysis for spectroscopic ellipsometry in semiconductor device fabrication.
Thin Solid Films,
Vol. 589,
Issue. ,
p.
258.
Heinrich, Anett
Bischoff, Jörg
Meiner, Kurt
Richter, Uwe
Mikolajick, Thomas
and
Dirnstorfer, Ingo
2015.
Interpretation of azimuthal angle dependence of periodic gratings in Mueller matrix spectroscopic ellipsometry.
Journal of the Optical Society of America A,
Vol. 32,
Issue. 4,
p.
604.
Brakstad, Thomas
Kildemo, Morten
Ghadyani, Zahra
and
Simonsen, Ingve
2015.
Dispersion of polarization coupling, localized and collective plasmon modes in a metallic photonic crystal mapped by Mueller Matrix Ellipsometry.
Optics Express,
Vol. 23,
Issue. 17,
p.
22800.
Fawzi, Zaki Sabit
Robert, Stéphane
El Kalyoubi, Ismail
and
Bayard, Bernard
2016.
Analysis and detection of an incorrect profile shape in a classical scatterometric process.
The European Physical Journal Applied Physics,
Vol. 76,
Issue. 3,
p.
31001.
Dixit, Dhairya
Green, Avery
Hosler, Erik R.
Kamineni, Vimal
Preil, Moshe E.
Keller, Nick
Race, Joseph
Chun, Jun Sung
O’Sullivan, Michael
Khare, Prasanna
Montgomery, Warren
and
Diebold, Alain C.
2016.
Optical critical dimension metrology for directed self-assembly assisted contact hole shrink.
Journal of Micro/Nanolithography, MEMS, and MOEMS,
Vol. 15,
Issue. 1,
p.
014004.
O’Mullane, Samuel
Dixit, Dhairya
and
Diebold, Alain
2016.
Metrology and Diagnostic Techniques for Nanoelectronics.
p.
65.
Shiqiu Cheng
Fengjiao Zhong
Huiping Chen
Yutao Jia
Shi, Yaoming
and
Xu, Yiping
2017.
Measurement of nanoscale grating structure by Mueller matrix ellipsometry.
p.
1.
Sanchez, Martha I.
Ukraintsev, Vladimir A.
Dixit, Dhairya
Keller, Nick
Kagalwala, Taher
Recchia, Fiona
Lifshitz, Yevgeny
Elia, Alexander
Todi, Vinit
Fronheiser, Jody
and
Vaid, Alok
2017.
Advanced applications of scatterometry based optical metrology
.
Vol. 10145,
Issue. ,
p.
101451H.
Foldyna, Martin
Togonal, Alienor Svietlana
Rusli
and
Roca i Cabarrocas, Pere
2017.
Optimization and optical characterization of vertical nanowire arrays for core-shell structure solar cells.
Solar Energy Materials and Solar Cells,
Vol. 159,
Issue. ,
p.
640.
Dixit, Dhairya
Keller, Nick
Lifshitz, Yevgeny
Kagalwala, Taher
Elia, Alexander
Todi, Vinit
Fronheiser, Jody
and
Vaid, Alok
2018.
Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes.
Journal of Micro/Nanolithography, MEMS, and MOEMS,
Vol. 17,
Issue. 03,
p.
1.
Chen, Xiuguo
Gu, Honggang
Jiang, Hao
Zhang, Chuanwei
and
Liu, Shiyuan
2018.
Probing optimal measurement configuration for optical scatterometry by the multi-objective genetic algorithm.
Measurement Science and Technology,
Vol. 29,
Issue. 4,
p.
045014.