Introduction

In 1979, Dr. Seliger proposed the concept of the focused ion beam (FIB) using liquid-metal gallium as an ion source [1]. The FIB tool focuses ions generated from an ion source using an electric field, irradiates the ion beam on to specimen surfaces, and observes microscopic specimen surfaces by scanning. The scan region of the ion beam can be selectively sputter etched when ions heavier than electrons are used. A scanning electron microscope (SEM) can be used for observation or analysis, but FIB can be used for both observation and processing. Many research organizations and companies are now involved in FIB development.

The Scientific Instruments Division of Seiko Instruments Inc. (currently SII Nano Technology Inc.) started research and development at the beginning of the 1980s and developed a technology called ion beam induced chemical vapor deposition (CVD). This technology makes it possible to accumulate thin films.

In 1984 SII introduced the world's first FIB photo mask repair tool called the SIR series [2]. White defects, the shaded part of the photo mask used in making integrated circuits that falls off, are filled in and repaired by an ion beam induced CVD of carbon film. Later, there were advances in technical development [3], such as the capability to repair black defects left over from shading material in parts that transmit light, and precision processing that corresponds to a miniaturization of the design rules.

In 1986, SII introduced the world's first multi-purpose commercial FIB tool called the SMI series.